Comparison ledger
Ontrak DSS 200 Integrated Circuit, Semitool 11600 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11600 SRDSemitool | |
|---|---|---|
| OEM | Ontrak | Semitool |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Ontrak DSS 200 Integrated Circuit | Semitool 11600 SRD |
| Cited variants | — | |
| Specifications | ||
| Wafer size range | 100mm to 200mm[1] | — |
| Throughput | 45-65 wafers per hour[2] | — |
| Cleaning method | Double-sided PVA scrub[1] | — |
| Brush type | Roller PVA[3] | — |
| Drying method | Spin dry with heat lamp[1] | — |
| Control system | Windows-based[3] | — |
| Brush boxes | Dual[1] | — |
| Ammonia dispense | Yes[1] | — |
| Robotic unload | Yes[1] | — |
| Touchscreen controls | Yes[1] | — |
| Configuration | — | Ceramic[4] |
| Manufacturer | — | Semitool[4] |
| Model | — | 11600 SRD[4] |
| Equipment type | — | Spin Rinse Dryer[4] |
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