Waferpedia

Comparison ledger

Model 2012versus150 e Mask

OAI Model 2012, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
OEMOAISUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyOAI Model 2012SUSS MicroTec 150 e Mask
Specifications
Product lineUV Exposure Systems[1]—
Product typeUV Exposure System[1]—
Datasheet listingOAI_Model 2012[1]—

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (1)Every fact above is drawn from these public sources
  1. [1]oainet.comoainet.com