Comparison ledger
Nikon NSR S 210 D, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 210 DNikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Resolution | 110nm[1] | — |
| Manufacturer | Nikon[1] | — |
| Tool type | Scanner[1] | — |
| Light-source product group | Deep UV[2] | — |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →