Comparison ledger
memsstar Orbis Alpha, Plasma-Therm 720/740, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Orbis Alphamemsstar | 720/740Plasma-Therm |
|---|---|---|
| OEM | memsstar | Plasma-Therm |
| Category | Etch | Etch |
| Wafer size | 200mm | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | memsstar Orbis Alpha | Plasma-Therm 720/740 |
| Cited variants | — | |
| Specifications | ||
| System type | oxide etch system[2] | — |
| Process chemistry | hydrogen fluoride etchants[2] | — |
| Footprint | small footprint[2] | — |
| Dimensions | 600 x 540 x 900 mm[2] | — |
| Control | PC controlled[2] | — |
| User interface | resistive touch screen[2] | — |
| Selectivity to silicon nitride and silicon dioxide | < 5% 1σ[2] | — |
| Uniformity | < 5% 1σ[2] | — |
| Repeatability | < 5% 1σ[2] | — |
| Endpoint capability | unique endpoint capability[2] | — |
| Substrate size range | sample sizes to 200 mm[2] | — |
| Selectivity (silicon nitride and silicon dioxide) | excellent (<5% 1σ)[2] | — |
| Uniformity and repeatability | <5% 1σ[2] | — |
| Control interface | PC controlled with resistive touch screen[2] | — |
| Endpoint detection | unique endpoint capability[2] | — |
| Process window | large process window to optimize process for any structure[2] | — |
| system type | — | dual chamber RIE loadlocked system[1] |
| chemistry | — | chlorine and fluorine based chemistry[1] |
| left chamber designation | — | 740 (left chamber), designated Au exposure system[1] |
| right chamber designation | — | 720 (right chamber), designated for chlorine and fluorine based etching of 2D materials and perovskites[1] |
| wafer capacity | — | up to 200mm diameter wafers[1] |
| Chemistry | — | chlorine and fluorine based[1] |
| Max wafer diameter | — | 200mm[1] |
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