Waferpedia

Comparison ledger

12 LapperversusTenuPol-5

Lapmaster 12 Lapper, Struers TenuPol-5, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
12 LapperLapmaster
TenuPol-5Struers
OEMLapmasterStruers
CategoryCMPCMP
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Struers TenuPol-5
Specifications
Outside plate diameter12 inches[1]—
Lapping Speed Range0 to 60 rpm[2]—
Wafer Size Compatibility4 inches or smaller[1]—
Input Voltage110 V[1]—
Frequency60 Hz[1]—
Phase1[1]—
Number of Rings3[1]—
Number of Weights3[1]—
Includes Slurry SystemYes[1]—
Includes TimerYes[1]—
Equipment type—Electropolishing[3]
Function—Prepares TEM sections of electrically conductive materials through electrolytical thinning[3]
Polishing voltage range—0-100 V (0.1 V steps)[4]
Polishing current—2.5 A[4]
Electrolyte container capacity—approximately 1 liter[5]
Recommended electrolyte temperature range—-50°C to +45°C (-58°F to +113°F)[5]
Pump flow rate range—0-50 (arbitrary units)[5]
Specimen disc diameters (pre-thinning)—10 mm[5]
Specimen disc diameters (final thinning)—3 mm[5]
Light stop detection—Auto or ignore[5]
Flow modes—Single flow, Dual flow step, Dual flow ramp[5]
Output voltage (polishing)—0-100 V (0.1 V steps)[4]
Output current (polishing)—2.5 A[4]
Width—270 mm (10.6")[4]
Depth—180 mm (7.1")[4]
Height—276 mm (10.9")[4]
Weight—3.8 kg (8.4 lbs)[4]
Operating temperature—5-40°C (41-104°F)[4]
Operating humidity—0-95 % RH non-condensing[4]
Storage temperature—-25-55°C (13-113°F)[4]
Storage humidity—0-95 % RH non-condensing[4]
Noise level—LpA = 55.4 dB(A) (measured value), Uncertainty K = 4 dB[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]jmind.comjmind.com
  2. [2]etd.ohiolink.eduetd.ohiolink.edu
  3. [3]snsf.stanford.edusnsf.stanford.edu
  4. [4]webshopcms.struers.comwebshopcms.struers.com
  5. [5]manualslib.commanualslib.com