Comparison ledger
Lam Research Rainbow 4526 XL, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4526 XLLam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4526 | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Configuration | Oxide Etch[1] | — |
| Wafer type | Jeida flat[1] | — |
| Valve type | VAT 65[1] | — |
| Software | Envision 1.6.1-005[1] | — |
| RF | ENI-GHW50 / ENI-2MHz[1] | — |
| Robot | Harmonic Drive[1] | — |
| Loader | Hine Indexers 38A[1] | — |
| Loadlock | Entrance & Exit LL[1] | — |
| Turbo Pump | HGP Pump[1] | — |
| Controllers | HGP / VAT 65[1] | — |
| Manufacturer | Lam Research[1] | — |
| Model | Rainbow 4526 XL[1] | — |
| Category | Etch[2] | — |
| Tool type | Plasma etcher[1] | — |
| Process | Oxide etch[1] | — |
| Wafer sizes | 6 inch, 8 inch[1] | — |
| ESC | Present[1] | — |
| Endpoint | Monochromator Endpoint[1] | — |
| RF cart | Present[1] | — |
| Gas chamber | Present[1] | — |
| Ar | 485.0 sccm[1] | — |
| CF4 | 20.0 sccm[1] | — |
| CHF3 | 20.0 sccm[1] | — |
| C4F8 | 19.5 sccm[1] | — |
| CO | 200.0 sccm[1] | — |
| O2 LOW | 20.0 sccm[1] | — |
| O2 HIGH | 1000.0 sccm[1] | — |
| N2 | 100.0 sccm[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[3] |
| Cryo DRIE etch rate | — | up to 5 µm/min[3] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[3] |
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