Comparison ledger
KLA .496 PSL Wafer, KLA Surfscan 6200 Particle Defect, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | KLA Surfscan 6200 |
| Specifications | ||
| Configuration | NIST Traceable[1] | Refurbished[3] |
| Wafer size | 8 inch[1] | — |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | — |
| Manufacturer | — | KLA[3] |
| Model | — | Surfscan 6200[3] |
| Wafer sizes | — | 8 inch[3] |
| Defect detection method | — | laser beam scanning[4] |
| Output displays | — | color-coded wafer maps, histograms, and summaries[4] |
| Detection capability | — | down to 0.157 µm at a 95% capture rate and down to 0.09 µm at an 80% capture rate[4] |
| Substrate sizes | — | 50mm (2 in), 76mm (3 in), 100mm (4 in), 125mm (5 in), 150mm (6 in), 200mm (8 in)[5] |
| Substrate material | — | silicon or any opaque, polished surface which scatters less than 5% of incident light[5] |
| Defect sensitivity | — | 0.10 µm diameter PSL sphere equivalent with greater than 90% capture rate[5] |
| Haze sensitivity | — | 0.02 ppm[5] |
| Haze resolution | — | 0.002 ppm[5] |
| Repeatability | — | 0.5% at 1σ[5] |
| Accuracy | — | ≥99%[5] |
| Dynamic range | — | 0.01 µm to 9,999 µm in a single measurement[5] |
| Illumination source | — | 30 mW Argon-Ion laser, 488 nm wavelength[5] |
| Control system | — | Microsoft Windows[4] |
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