Waferpedia

Comparison ledger

Integrity-20versusIntegrity-36

Denton Vacuum Integrity-20, Denton Vacuum Integrity-36, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Integrity-20Denton Vacuum
Integrity-36Denton Vacuum
OEMDenton VacuumDenton Vacuum
CategoryOphthalmic coating systemOphthalmic coating system
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control systemWindows basedWindows NT
Generation——
FamilyDenton Vacuum Integrity-20Denton Vacuum Integrity-36
Cited variants
  • Integrity 20[1]
—
Specifications
ModelIntegrity-20[1]—
System typeOphthalmic AR coating system[1]—
PositioningCompact, economical, easy to operate[1]—
AutomationTouch and Coat Automation[1]—
Control softwareWindows-based operating software[1]—
Deposition methodIon-Assisted Deposition[1]—
ProcessGlareban AR coating process[1]—
FixturingFast-Flip fixturing[1]—
Coating chamber size20" x 24" x 28"[1]—
Deposition source capacity16 lenses (70 mm uncut lens)[1]—
Cycle time48 min./Both sides[1]—
System size48" x 77" x 30"[1]—
Vacuum chamber material—304 stainless steel[2]
Vacuum chamber dimensions—36" wide x 36" deep x 42" high[2]
Vacuum chamber door—Full-width front door with two-point articulating hinges and Viton O-ring seal[2]
Pumping system—APD Cryogenics Marathon 12 cryogenic pump, APD Displex water-cooled compressor, Edwards E2M175 two-stage rotary vane mechanical pump, and Polycold PFC330ST cryogenic cooler[2]
Vacuum gauging—Two Leybold Inficon ITR100 wide-range Bayard-Alpert ionization gauge tubes and two Leybold Inficon TTR211S Pirani transmitters[2]
Process gas control—MKS 2179 mass flow controller, 0-100 SCCM in fixed flow mode[2]
Substrate rotation—Standard direct drive single rotation system with 1.0" diameter shaft[2]
Substrate heaters—Two 3 kW radiant quartz heater assemblies[2]
Ion source—DVI CC-105 cold cathode ion source with Senvac GD20/600 and Sorensen DCS 33-33 power supplies[2]
Electron beam source—TFI-Telemark TFI-261-06 six-pocket rotary crucible source with ST-4 4.0 kW power supply[2]
Low voltage resistance source—Denton Vacuum 4.0 kW two-position A/B low voltage resistance evaporation power supply[2]
Deposition controller—Inficon XTC/2 quartz crystal controller with single crystal sensor[2]
Control system—Gateway computer with 17" SVGA monitor, IEEE-488 and RS-232 interfaces, and GE Fanuc 9030 PLC via RS-485 using GE Cimplicity HMI software[2]
Control modes—Automatic, Manual, and Service[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org