Waferpedia

Comparison ledger

FPA 6000 ES 6 aversus1000 Family

Canon FPA 6000 ES 6 a, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1000 FamilyUltratech
OEMCanonUltratech
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 6000Ultratech 1000 Family
Specifications
Configuration248nm (KrF)[1]—
ManufacturerCanon[2]—
ModelFPA 6000 ES 6 a[1]—
Wafer size12 inch[1]—
Exposure wavelength248nm (KrF)[2]—
ProcessDUV (248nm) KRF[3]—
CategoryLithography[2]—
Tool typelithography scanner[2]Photolithography step-and-repeat 1X stepper[5]
Numerical aperture (NA)0.55 ~ 0.86[4]—
Resolution0.09µm[4]—
Reticle size6in. (0.25in. thick)[4]—
Reduction ratio4:1[4]—
Field size26mm x 33mm[4]—
Overlay accuracy≤8nm (M+3)[4]—
Throughput≥100wph (300mm, 122shots); ≥170wph (200mm, 58shots)[4]—
Scanner vintage2005[3]—
Optical design—Wynne Dyson[5]
Magnification—1X[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]agsemiconductor.comagsemiconductor.com
  4. [4]generalmanual.comgeneralmanual.com
  5. [5]en.wikipedia.orgen.wikipedia.org