Waferpedia

Comparison ledger

FPA 3000 i 4 i-Lineversus150 e Mask

Canon FPA 3000 i 4 i-Line, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
OEMCanonSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 3000SUSS MicroTec 150 e Mask
Specifications
Reticle size6"[1]—
Wafer typeNotch[1]—
Auto feedLeft hand[1]—
Chuck typePin[1]—
GBR unitNo[1]—
Cassette barcodeNo[1]—
Reticle barcodeNo[1]—
Track interface/typeYes, DNS[1]—
Software versionV4.08B.09[1]—
ConfigurationMissing parts:[1]—
Date of lens data4/3/2020[1]—
IUC Uniformity NA/Sigma mode (54/60)9087[1]—
IUC Distribution NA/Sigma mode (54/60)1.753[1]—
Wafer Size8 inch[2]—
Reticle Size6 inch[1]—
Track InterfaceYes, DNS[1]—
Missing PartsPCBs from D-Rack, Main computer[1]—
Lens Data Date4/3/2020[1]—
Vintage1994[2]—

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing