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017-0146-01 PrealignerversusAP 300 E Lithography

Brooks 017-0146-01 Prealigner, Veeco AP 300 E Lithography, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
017-0146-01 PrealignerBrooks
AP 300 E LithographyVeeco
OEMBrooksVeeco
CategoryLithographyLithography
Wafer size—Warped Wafer Handling to 500 um
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0146-01 PrealignerVeeco AP 300 E Lithography
Specifications
Configuration—2.0 um Resolution, Extended Field, ghi-line Broadband Lens Dual 1200 Watt Lamp llluminator[1]
Universal Size/Warped Wafer Kit—200 mm and 300 mm[1]
Wafer size—Warped Wafer Handling to 500 um[1]
Dual Flip Aperture—([68mm/44mm/34.2mm] x 26mm)[1]
Power Source—208 V three phase, 5 wire, 150 amp[1]
Resolution—2.0 µm[1]
Optics—extended-field, ghi-line broadband lens[1]
Illuminator—Dual 1200 Watt Lamp Illuminator[1]
Field size—68 x 26 mm[1]
Warped wafer handling—to 500 um[1]
Alignment system—PATMAX MVS Alignment System[1]
MVS alignment spectrum—530 - 570 nm[1]
Reticle stack—6 slot, manual front loading[1]
Reticle type—6 x 6 x 0.25 inch[1]
Wafer handling—Universal Size/Warped Wafer Kit: 200 mm and 300 mm[1]
Wafer thickness handling—0.4 mm to 2.0 mm[1]
Edge exposure system—WEE 3[1]
Edge exclusion system—one exclusion ring; exclusion ring width 1 - 5 mm protection available[1]
Communications—GEM HSMS[1]
Auto filter changer—ghi-line auto filter changer[1]
Open cassette adapter—QTY 2[1]
Environmental chamber—shipped from supplier (white)[1]
Lens protection—requires closed loop cooler[1]
Lens distortion reference—no lens matching[1]
Closed loop cooler—included[1]
Enhanced bottom pellicle—included[1]
Gen 4 Fanout 300—300mm wafer size only[1]
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Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing