Waferpedia

Comparison ledger

200 ACUversusPlasmalab 100 ICP 180

Axcelis 200 ACU, Oxford Instruments Plasmalab 100 ICP 180, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200 ACUAxcelis
Plasmalab 100 ICP 180Oxford Instruments
OEMAxcelisOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Oxford Instruments Plasmalab 100
Specifications
ConfigurationParts Machine[1]50/60 Hz[5]
ManufacturerAxcelis[1]—
Model200 ACU[1]Plasmalab 100 ICP 180[5]
Tool typeAsher[1]—
Wafer size200mm[3]—
Serial numberAU6A356AH[3]—
Computer systemM 200 PC, M 200[4]—
Part numberSC 4572 A[4]—
Volts208[4]—
Amps30[4]—
Equipment typeAsher[1]—
Wafer configuration8 inch[2]—
Phase—3 Phase[5]
Voltage—208 Vac[5]
OEM—Oxford Instruments[5]
Category—Etch[6]
Power phase—3 Phase[6]
Frequency—50/60 Hz[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]wotol.comwotol.com
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]inventory listing
  6. [6]waferpedia.comwaferpedia.com