Waferpedia

Comparison ledger

200 ACUversus2300 e 5 Kiyo

Axcelis 200 ACU, Lam Research 2300 e 5 Kiyo, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200 ACUAxcelis
2300 e 5 KiyoLam Research
OEMAxcelisLam Research
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Lam Research 2300
Specifications
ConfigurationParts Machine[1]3 Chamber + 1 Strip[5]
ManufacturerAxcelis[1]—
Model200 ACU[1]—
Tool typeAsher[1]—
Wafer size200mm[3]—
Serial numberAU6A356AH[3]—
Computer systemM 200 PC, M 200[4]—
Part numberSC 4572 A[4]—
Volts208[4]—
Amps30[4]—
Equipment typeAsher[1]—
Wafer configuration8 inch[2]—
Loadport—TDK TAS300[5]
ATM Robot—Kawasaki P/N 3NT510B-A002[5]
TM Robot—Brooks 201600-294-0002[5]
MKS E28D-29237 Process Vacuum Gauge—0.1 Torr[5]
MKS 625D-30518 Chamber Vacuum Gauge—1 Torr[5]
Number of Chambers—3 Chamber + 1 Strip[5]
Turbo Pump—Edwards STP-XA3203CV[5]
Turbo Pump Controller—Edwards SCU-1600[5]
Bias RF Generator—Lam 3156110-214[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]wotol.comwotol.com
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]inventory listing