Comparison ledger
ASML Twinscan NXT 2050 i Immersion, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan NXT 2050 i Immersion | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Wafer size | 12 inch[1] | — |
| Exposure wavelength | 193 nm ArF[2] | — |
| Optics type | Immersion[2] | — |
| Stage design | Dual-stage[2] | — |
| Throughput | well above 250 wafers per hour under volume conditions[2] | — |
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