Comparison ledger
ASML PAS 5500 300 C Wafer, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000 FamilyUltratech | |
|---|---|---|
| OEM | ASML | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 5500 | Ultratech 1000 Family |
| Specifications | ||
| SW version | 8.9.0.c[1] | — |
| PC (Sun) | Netra[1] | — |
| Chuck Type | SiC (LC)[1] | — |
| Light source (Cymer Laser) | 5600 KrF[1] | — |
| CLEAR (auto chuck cleaning) | N/A[1] | — |
| STARTSMART (overlay improvement) | N/A[1] | — |
| DoseMapper (CD improvement) | NO[1] | — |
| CPE (Correction per exposure) | NO[1] | — |
| Configuration | Test Streaming (Cycle time improvement, test queue insertion into batch streaming): auditing[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[2] |
| Optical design | — | Wynne Dyson[2] |
| Magnification | — | 1X[2] |
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