Waferpedia

Comparison ledger

Reflexion LKversus100R16

Applied Materials Reflexion LK, Strasbaugh 100R16, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Reflexion LKApplied Materials
100R16Strasbaugh
OEMApplied MaterialsStrasbaugh
CategoryCMPCMP
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials ReflexionStrasbaugh 100R16
Specifications
ConfigurationMiniship[1]—
Wafer size300 mm[3]—
Removal rate>6452 Å/min[3]—
Non-uniformity<4%[3]—
Pressure1.5 psi[3]—
Slurry flow rate300 ml/min[3]—
Platen/Carrier rotary speed97/103 rpm[3]—
Gas delivery300 ml/min[1]—
type—1 spindle grinder/polisher[4]
drive system—DC drive system with 2 motors[4]
spindle RPM—1-180 RPM[4]
eccentric RPM—1-90 RPM[4]
controls—digital timer; air down switch; spindle and eccentric speed dials; air regulators[4]
capacity—16 inches[4]
spindle size—1-8 TPI[4]
overall dimensions—28 inches x 36 inches x 48 inches[4]
weight—500 lbs[4]
origin—made in the USA[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]doi.orgdoi.org
  4. [4]excelltechnology.comexcelltechnology.com