Comparison ledger
Applied Materials E 500 EHPI Medium Current, Applied Materials E 500 HP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | E 500 EHPI Medium CurrentApplied Materials | E 500 HPApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | Wafer Position Detect | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials E 500 | Applied Materials E 500 |
| Specifications | ||
| Loading Configuration | Open Cassette[1] | — |
| Software | V 13.30 rev D[2] | — |
| Floppy Drive Type | 3.5"[2] | — |
| Configuration | CE Mark[2] | Medium Current[3] |
| Energy Range | 10 KeV - 200 KeV[1] | — |
| Solid State Scanner | 30 KV[2] | — |
| Gas Box Type | HP[1] | — |
| Computer Type | Pentium[2] | — |
| OEM | Applied Materials / Varian[2] | — |
| Model | E 500 EHPI[1] | — |
| Category | Ion Implantation[1] | — |
| Wafer Sizes | 6 inch[2] | — |
| Load Lock Turbo | V 300 HT[2] | — |
| Source Zone Turbo Pump | STP 1000[2] | — |
| Scanner Turbo Pump | STP 1000[2] | — |
| Analyzer Turbo Pump | V 300 HT[2] | — |
| Vacuum Pumps (3) | Edwards QDP 80, QMB 250[2] | — |
| Pump Type | Dry[2] | — |
| Wafer size | Wafer Position Detect[2] | — |
| Wafer size / detect | Wafer Position Detect[1] | — |
| Scanner | Solid State Scanner, 30 KV[2] | — |
| Control interface | GEM/SECS; SECS II Interface[2] | — |
| Wafer Size | — | 8 inch[3] |
| Current Type | — | Medium Current[3] |
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