Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, KLA 5100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 5100KLA |
|---|---|---|
| OEM | Applied Materials | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | KLA 5100 |
| Cited variants | — |
|
| Specifications | ||
| Make | Applied Materials[2] | — |
| Model | 0010-22161[2] | — |
| Description | HTESC PH 1 REV A[3] | — |
| Condition | Used[3] | — |
| Stock Number | BM6628[3] | — |
| Step measurement range | — | 100 Å to 300 µm[4] |
| Sample table | — | 200 mm with vacuum[4] |
| Maximum sample thickness | — | 20 mm[4] |
| Minimum sample length | — | 25 mm[4] |
| Wafer handling | — | Dual SMIF Cassette loader, 200mm[4] |
| Optics | — | 12k and 750 micron FOV optical microscopes with light source[4] |
| Microscope | — | 50 micron FOV with optical measurement, interferometer measurement, and autofocus[4] |
| Software | — | Windows NT / VAX[4] |
| Operating system | — | VMS[4] |
| Backup | — | SCSI back up unit[4] |
| Printer | — | Thermal mini printer[4] |
| Tool type | — | metrology and inspection tool[4] |
| Measurement application | — | overlay measurement on wafers[4] |
| Wafer size | — | 8-inch wafers[4] |
| Optical system | — | optical microscopes for measurement functions[4] |
| Microscope set | — | 12k microscope and a 750 micron field-of-view microscope with a light source[4] |
| Microscope functions | — | 50 micron field-of-view microscope performs optical measurement, interferometer measurement, and autofocus[4] |
| Measurement range | — | 100 Å to 300 µm[4] |
| Control software | — | Windows NT / VAX software[4] |
| Backup unit | — | SCSI Back up unit[4] |