Comparison ledger
Applied Materials 0010-16392 ESC Assembly, Applied Materials Centura DPS Poly, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-16392 ESC AssemblyApplied Materials | Centura DPS PolyApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-16392 ESC Assembly | Applied Materials Centura DPS Poly |
| Cited variants | — |
|
| Specifications | ||
| OEM | Applied Materials[2] | — |
| Model | 0010-16392[2] | — |
| Type | ESC Assembly[2] | — |
| Wafer Size | 300 mm[3] | 6 inch[4] |
| Electrode Configuration | Dual[3] | — |
| Tool Type | — | Poly Etcher[4] |
| Plasma Source Type | — | Decoupled Plasma Source (DPS)[1] |
| RF Pulsing Frequency | — | 1 kHz to 5 kHz[1] |
| Chamber Coating Material | — | Alumina or Y2O3[1] |
| Supported Process Node | — | 28 nm[1] |
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