Comparison ledger
Applied Materials 0010-13622 RF Match for, Veeco Savannah G 2, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Savannah G 2Veeco |
|---|---|---|
| OEM | Applied Materials | Veeco |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Veeco Savannah G 2 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Product type | — | Deposition Tool[2] |
| Process | — | Atomic Layer Deposition (ALD)[3] |
| Configurations | — | S100, S200, S300[2] |
| Substrate size | — | up to 300 mm for S300[2] |
| Operational modes | — | Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio)[4] |
| Power | — | 115 VAC or 220 VAC, 1900 W (excluding pump); S300 2000 W[4] |
| Controls | — | LabVIEW™, Windows™ 7, Lenovo Laptop, USB control[4] |
| Maximum substrate temperature | — | S100: RT - 400 °C; S200: RT - 350 °C; S300: RT - 350 °C[4] |
| Deposition uniformity (Al2O3) | — | <1% (1σ)[4] |
| Cycle time | — | <2 seconds per cycle with Al2O3 at 200 °C[4] |
| Vacuum pump | — | Adixen 2021 C2 - 14.6 CFM (or higher on request)[4] |
| Compatibility | — | Clean room class 100 compatible[4] |
| Compliance | — | CE, SEMI S2 optional[4] |
| Ports | — | 2 lines standard, up to 6 lines available[4] |
| Valves | — | High speed ALD valves with 10 msec response time[4] |
| Precursor cylinders | — | Individually heated 50 ml stainless steel cylinders, optional larger cylinders available[4] |
| Carrier/venting gas | — | N2 mass flow controlled, 100 SCCM[4] |
| Low vapor pressure delivery system | — | LVPD system[4] |
| Ozone generator | — | Integrated self contained ozone solution[4] |
| Glove box interface | — | Integrated to allow direct loading from within a glove box[4] |
| In-situ ellipsometry | — | For real time wafer-state metrology[4] |
| In-situ QCM | — | For rapid process diagnostic and optimization[4] |
| Type of product | — | Deposition Tool[2] |
| Precursor delivery lines | — | 2 lines standard, up to 6 lines available[4] |
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