Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Ultron UH 104 12 UV, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | UH 104 12 UVUltron |
|---|---|---|
| OEM | Applied Materials | Ultron |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Ultron UH 104 12 UV |
| Cited variants | — | |
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | UH 104 12[6] |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Make | — | Ultron[6] |
| System type | — | UV curing system[6] |
| Line designation | — | UH104-8/UH104-12[1] |
| Curing process | — | Cool, low-temperature UVA 365nm[1] |
| UV lamp | — | Environmentally safe, ozone-free UV lamp array[1] |
| Wafer capacity | — | Up to 300mm frame-mounted wafer[1] |
| Controller | — | Easily programmable microprocessor-based controller[1] |
| Operation | — | Repeatable, reliable, single-frame, manual operation[1] |
| Workstage | — | Optional motorized, rotating workstage[1] |
| Dimensions (UH104-12 height) | — | 11-1/8"[1] |
| Dimensions (UH104-12 width) | — | 25-1/8"[1] |
| Dimensions (UH104-12 depth) | — | 25-3/16"[1] |