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Comparison ledger

0010-03485 Magnet AssyversusBTX-475

Applied Materials 0010-03485 Magnet Assy, ESPEC BTX-475, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
BTX-475ESPEC
OEMApplied MaterialsESPEC
Category——
Wafer size——
Process node——
Introduced——
Production run——
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Control system——
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FamilyApplied Materials 0010-03485 Magnet AssyESPEC BTX-475
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Documentation—Datasheet (1 document)[5]
Interior Volume—4 cu. ft. (110 L)[6]
Interior Dimensions (W x D x H)—19.6" x 15" x 23.6" (500 x 380 x 600 mm)[6]
Exterior Dimensions (W x D x H)—30.25" x 33.5" x 46" (770 x 850 x 1170 mm)[6]
Temperature Range—-70 to 180 °C (-94 to 354 °F)[6]
Humidity Range—10% - 95% RH[6]
Average Heating Rate—2.75 °C/min (empty, per IEC 60068 3-5, at supply sensor)[6]
Average Cooling Rate—2.5 °C/min (empty, per IEC 60068 3-5, at supply sensor)[6]
Power Requirement—208/230 V, 1ph, 60 Hz, 20 service amps (NEMA 6-20 plug)[6]
Temperature Fluctuation—±0.5 °C (at control sensor)[6]
Humidity Fluctuation—±5% (at control sensor)[6]
Temperature Gradient (Uniformity)—±1.5 °C (below 100 °C, empty)[6]
Humidity Gradient (Uniformity)—±5% (empty)[6]
Weight—Approx. 500 lbs (227 kg)[7]
Sources (7)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]metrologymanuals.commetrologymanuals.com
  6. [6]espec.comespec.com
  7. [7]frankbacon.comfrankbacon.com