Waferpedia

Comparison ledger

0010-03254 E ChuckversusCW 2000 Compact

Applied Materials 0010-03254 E Chuck, SCREEN CW 2000 Compact, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
OEMApplied MaterialsSCREEN
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—SCREEN CW 2000
Specifications
Station 1—Loader[1]
Station 2—ACT 930 (Solvent for Etch Residue and Positive Photoresist)[1]
Station 3—Quick Dump Risse (QDR)[1]
Station 4—IPA[1]
Station 5—Quick Dump Rinse (QDR)[1]
Station 6—Drain IPA Substitution (DIS)[1]
Make—SCREEN / DNS[1]
Model—CW 2000[1]
Equipment type—Wet Station[1]
Wafer sizes—2, 4, 5, 6, 8 inch[1]
Vintage—2018[2]
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing