Comparison ledger
ABM Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MaskABM | 1000 FamilyUltratech |
|---|---|---|
| OEM | ABM | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM Mask | Ultratech 1000 Family |
| Cited variants | — | |
| Specifications | ||
| Configuration | Using 1000 Watt DUV light source[3] | — |
| Tool type | Mask aligner[3] | Photolithography step-and-repeat 1X stepper[4] |
| Wafer sizes | 2 in, 3 in, 4 in, 12 in[3] | — |
| Substrate capability | From 100 mm down to small pieces[1] | — |
| Light source | 1000 Watt DUV light source[3] | — |
| Mask size | Up to 5 in[3] | — |
| Tool manufacturer | ABM[1] | — |
| Tool model | 3000HR[1] | — |
| Exposure methods | Flood, soft, hard, and vacuum contact[2] | — |
| Exposure wavelengths | 365 nm to 400 nm[2] | — |
| Resolution | 800 nm[2] | — |
| Optical design | — | Wynne Dyson[4] |
| Magnification | — | 1X[4] |
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