Waferpedia

Comparison ledger

450 PB 12 Polyimideversus58TA

YES 450 PB 12 Polyimide, YES 58TA, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
58TAYES
OEMYESYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyYES 450YES 58TA
Specifications
Wafer sizeCapacity is two 25 wafer cassettes in a batch process (50 wafers at a time) - 300mm FOUP[1]—
Chamber Material316L Stainless Steel[1]—
Operation Temperatureambient to 450°C (option high temp version: Ambient to 550°()[1]—
Process Gas Inputs1 standard up to 3 optional[1]—
ConfigurationPreheated N, (Process Gas)[1]—
Mass Flow Controllersoptional, up to 3[1]—
Laminar Flow Filter100 micron Mott'" plate filter[1]—
Cleanlinessparticle reduction in most applications[1]—
OEMYES[1]—
Model450 PB 12[1]—
CategoryThermal / Diffusion[2]—
CapacityTwo 25-wafer cassettes in a batch process (50 wafers at a time)[1]—
FOUP compatibility300mm FOUP[1]—
Wafer handlingUses wafer cassette; wafers are manually brought to the machine and loaded inside[1]handles wafers up to 300 mm[3]
Operation temperatureAmbient to 450°C[1]ambient to 180 °C[3]
Gas delivery1 standard up to 3 optional[2]—
Process gasPreheated N2[1]—
VacuumAlternate vacuum valve for process vacuum[2]—
Vacuum plumbingVCR[2]—
Number of Recipes8 temperature profiles (up to 200 with YES - DAQ-LR option)[1]—
TemperatureAmbient to 450°C with LED temperature and set point displays[1]—
Voltage208V, 3 Phase 50/60 Hz, 40 amps[1]—
Oxygen Concentration10 ppm over background[1]—
Image reversal bake throughput—1 load/hour[3]
Vacuum bake/vapor prime throughput—2 loads/hour[3]
Process control—fully programmable process time and temperature[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]pnf.uchicago.edupnf.uchicago.edu