Waferpedia

Comparison ledger

12-2P-CPversusPBX4-300

YES 12-2P-CP, YES PBX4-300, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMYESYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyYES 12-2P-CPYES PBX4-300
Cited variants
  • YES-PBX4-300[2]
Specifications
Model designation12-2P-CP[1]—
SeriesYES-PB Series / 450PB Series[1]—
Wafer size300 mm wafers[1]—
Load typemanual load[3]—
Application scopeMEMS and semiconductor process applications[4]—
Cooling packageAir-only cooling package; no water[1]—
AirflowVertical laminar airflow[1]—
High vacuum10-6[1]—
Maximum temperatureup to 450°C[1]—
Interfacetouch screen interface[4]—
Tool typemanual-load high-temperature cure oven[3]—
Process applicationsMEMS and semiconductor process applications[3]—
Product line—Fully Automated 300mm and 200mm Polyimide/BCB/Copper Anneal/Vacuum Bake System[2]
Model—YES-PBX4-300[2]
System type—Fully automated polyimide/BCB/copper anneal and vacuum bake system[2]
Wafer size compatible—300mm and 200mm[2]
Category—Thermal / Diffusion[5]
Product family—YES PBX4-300[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org
  4. [4]web.archive.orgweb.archive.org
  5. [5]waferpedia.comwaferpedia.com
  6. [6]waferpedia.comwaferpedia.com