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Comparison ledger

Alpha 303 i Verticalversus0332 F 9453 302 Diffusion

Tokyo Electron Alpha 303 i Vertical, Varian 0332 F 9453 302 Diffusion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Alpha 303 i VerticalTokyo Electron
OEMTokyo ElectronVarian
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTokyo Electron Alpha 303Varian 0332 F 9453 302 Diffusion
Specifications
ConfigurationTEOS[1]—
Wafer Size12 inch (300 mm)[1]—
ManufacturerTokyo Electron (Tel)[1]—
ModelAlpha 303 i[1]—
TypeVertical Furnace[1]—
Process (TEOS)TEOS[1]—
Process (Nitride)Nitride[2]—
Process (Cure)Cure[3]—
Asset Number—142841[5]
Last Confirm Date—October 14, 2025[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]Equipment inventory listing
  6. [6]fab-spares.comfab-spares.com