Comparison ledger
SUSS MicroTec MA 200, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA 200SUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec MA 200 | Ultratech 1000 Family |
| Specifications | ||
| Voltage | 230 V[1] | — |
| Configuration | 3200 VA[1] | — |
| Frequency | 50 Hz[1] | — |
| Manufacturer | SUSS[1] | — |
| Model | MA 200[1] | — |
| Category | Aligner[2] | — |
| Wafer sizes | 6 inch[1] | — |
| Referenced in process guidance | AZ P4000 Series exposure-dose guidance lists Suss MA-200 and gives approximate dose values of 1.5 μm = 90 mJ/cm2, 3.5 μm = 135 mJ/cm2, and 12 μm = 800 mJ/cm2[3] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[4] |
| Optical design | — | Wynne Dyson[4] |
| Magnification | — | 1X[4] |
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