Comparison ledger
SUSS MicroTec MA 150 E, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA 150 ESUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec MA 150 | Ultratech 1000 Family |
| Specifications | ||
| Configuration | Refurbished[1] | — |
| Wafer size | 150mm (6 inch)[2] | — |
| Exposure optics | UV400 (365nm/405nm)[3] | — |
| Lamphouse power | 1000 Watt[4] | — |
| Alignment accuracy | < 1.0 µm[3] | — |
| Operating system | Windows 2000[4] | — |
| Power supply | CIC1200[3] | — |
| Microscope | DVM6 Microscope[4] | — |
| Prealigner type | XRS[3] | — |
| Exposure modes | Hard, Soft, Proximity, Vacuum Contact[4] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[5] |
| Optical design | — | Wynne Dyson[5] |
| Magnification | — | 1X[5] |
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