Comparison ledger
STS 310, Temescal FC-2000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 310STS | FC-2000Temescal |
|---|---|---|
| OEM | STS | Temescal |
| Category | Deposition | Deposition |
| Wafer size | 100mm | 100mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | STS 310 | Temescal FC-2000 |
| Cited variants | — | |
| Specifications | ||
| Tool type | plasma-enhanced chemical-vapor-deposition (PECVD) system[2] | — |
| Wafer size | 100-mm-diameter silicon wafers[2] | — |
| Deposition material | silicon dioxide[2] | — |
| Process | Plasma-enhanced chemical vapor deposition (PECVD)[2] | — |
| Wafer Size | 100 mm[2] | — |
| Deposited Materials | Silicon dioxide (oxide) and silicon nitride (SiNx)[2] | — |
| Oxide Recipe Details | 2% SiH4 in Ar at 400 sccm, N2O at 900 sccm, 60 W at 13.56 MHz, 650 mtorr, 300 °C[2] | — |
| Nitride Recipe (Low RI) Details | 2% SiH4 in Ar at 200 sccm, N2 at 2000 sccm, power alternating between 30 W at 13.56 MHz for 6 s and 25 W at 187 kHz for 3 s, 650 mtorr, 300 °C[2] | — |
| Nitride Recipe (High RI) Modification | Increase 2% SiH4/Ar flow to 500 sccm[2] | — |
| Temperature | 300 °C[2] | — |
| Pressure | 650 mtorr[2] | — |
| System name | — | Temescal FC-2000 deposition system[1] |
| System type | — | Bell jar deposition system[1] |
| Operation | — | Fast-cycle, load-locked system[1] |
| Vacuum handling | — | Allows the source to remain under vacuum during substrate reloading[1] |
| Source tray | — | Supports multiple electron beam and resistance sources[1] |
| Standard source-to-substrate distance | — | 19.5 in[1] |
| Optional source-to-substrate distance with extension collar | — | 27.5 in[1] |
| Bell jar diameter | — | 20 in (508 mm)[1] |
| FC-2000 source tray diameter | — | 18 in (457 mm)[1] |
| Control system | — | Temescal Control System (TCS)[1] |
| Deposition controller | — | Inficon XTC/3 deposition controller[1] |
| Electron beam power supply | — | Temescal model CV-6SLX electron beam power supply[1] |
| Beam sweep controller | — | Temescal SuperSweep64 programmable beam sweep controller[1] |
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