Waferpedia

Comparison ledger

Mecapol E 460versus100R16

STEAG Mecapol E 460, Strasbaugh 100R16, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
100R16Strasbaugh
OEMSTEAGStrasbaugh
CategoryCMPCMP
Wafer size4"—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySTEAG Mecapol E 460Strasbaugh 100R16
Specifications
System typesemi-automatic system for polishing and planarization of wafers[1]—
Wafer compatibility4", 6", and 8" wafers[1]—
Other sample handlingother wafer sizes or chips can be processed by bonding them to a carrier wafer[1]—
Slurry delivery2 pumps[1]—
Conditioning systemex-situ conditioning system[1]—
Wafer size compatibility4", 6", 8"[1]—
Slurry pumps2 pumps[1]—
Equipment typeSemi-automatic CMP (chemical mechanical polishing) tool[1]—
Wafer size4", 6", 8"[1]—
Carrier wafer processingOther wafer sizes or chips can be processed by bonding them to a carrier wafer[1]—
Available slurries30N50, 30H50, 40EA50[1]—
Oxide polishing targetThermal oxide thickness range less than 500 A; removal rate 2600–2800 A/min; removal rate can be 2 to 5 times higher on deposited oxides[1]—
Silicon polishingGlobal removal around 8 to 10 µm for 10 min[1]—
Consumable setsTwo sets: one for microelectronic layers polishing and one for copper polishing[1]—
Microelectronic compatibilityNot a micro-electronic compatible tool[1]—
Wafer size support4", 6", 8"[1]—
Conditioning typeex-situ[1]—
Tool typesemi-automatic[1]—
Typesemi-automatic system[1]—
Processpolishing and planarization of wafers[1]—
type—1 spindle grinder/polisher[2]
drive system—DC drive system with 2 motors[2]
spindle RPM—1-180 RPM[2]
eccentric RPM—1-90 RPM[2]
controls—digital timer; air down switch; spindle and eccentric speed dials; air regulators[2]
capacity—16 inches[2]
spindle size—1-8 TPI[2]
overall dimensions—28 inches x 36 inches x 48 inches[2]
weight—500 lbs[2]
origin—made in the USA[2]

Plan your fab

Building a CMP process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]epfl.chepfl.ch
  2. [2]excelltechnology.comexcelltechnology.com