Waferpedia

Comparison ledger

CPX Pegasusversus90 X

SPTS CPX Pegasus, Tegal 90 X, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: Etch, null[1]
Side-by-side comparison of selected equipment models
Attribute
90 XTegal
OEMSPTSTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySPTS CPX PegasusTegal 90 X
Specifications
Configuration2 Chambers[2]Dry Etch[5]
Frequency60Hz[2]—
Source RF GeneratorMKS 6.5 kw RF Power Generator[2]—
Platen RF GeneratorMKS/ENI ACG 3B 13.56MHz RF Generator[2]—
Rotary Pump3 PCS[2]—
Turbo pump2 PCS[2]—
DI WaterSMC HRZ-L2-DY chiller[2]—
Silicon oilSMC HRZL-D chiller[2]—
ManufacturerSPTS / STS (also listed under KLA / SPTS)[2]—
Wafer Size8 inch (200 mm)[2]—
Wafer Size (alternate)200 mm[3]—
Number of Chambers2[2]—
Voltage380 Volts[2]—
Voltage (alternate)400 Volts[3]—
Current160 Amps[2]—
RF Source GeneratorMKS 6.5 kW RF Power Generator[2]—
RF Platen GeneratorMKS/ENI ACG 3B 13.56MHz RF Generator[2]—
Rotary Pump Quantity3 PCS[2]—
Turbo Pump Quantity2 PCS[2]—
Pressure System ComponentsMKS Baratron gauge (10-4~10-1 m Torr), MKS 750 capacitance (10-760 Torr), BOC EDWARDS Active gauge (10-4mTorr~10Torr), ESC (ceramic)[2]—
Gases SupportedSF6, C4F8, O2, N2, Ar[2]—
Gas Flow RatesC4F8 400 sccm, SF6 1200 sccm, Ar 500 sccm, O2 200 sccm[2]—
Wafer Handling RobotBrooks MagnaTran 7[2]—
Cooling/Heating SystemsHouse Water, DI Water chiller (SMC HRZ-L2-DY), Silicon oil chiller (SMC HRZL-D), Insert Heaters[2]—
PlatformCPX[3]—
ModulePegasus[3]—
Database Version4.16[3]—
Installation TypeThru-Wall[3]—
Wafer Flat OrientationRound with notch[3]—
Clamp TypeTDESC[3]—
MFCsMKS[3]—
Pump TypeEDWARDS[3]—
Cluster Transfer PumpALCATEL[3]—
Dry Pumps1-DS80, 2-DS700[4]—
Chillers1-HRZ001-L2-DV, 2-HRZ001-L-D[4]—
SoftwareDSIE CP0148[4]—
GasboxPeg/HRM[3]—
EPD (End Point Detection)No[3]—
Vintage Year2006[2]—
Vintage Year (alternate)2012[3]—
SF6Purity 99.999%(5N)[2]—
C4F8Purity 99.999%(5N)[2]—
O2Purity 99.9995%(5N5)[2]—
N2Purity 99.9995%(5N5)[2]—
ArPurity 99.9995%(5N5)[2]—
OEM—Tegal[5]
Model—90 X[5]
Tool type—Plasma Etcher[5]
Process type—Dry Etch[5]
Related description—non-critical etch tool[1]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]macquarie.commacquarie.com
  5. [5]inventory listing
  6. [6]inventory listing