Comparison ledger
Plasma-Therm Unaxis ICP, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Unaxis ICPPlasma-Therm | 1512eTegal |
|---|---|---|
| OEM | Plasma-Therm | Tegal |
| Category | Etch | Etch |
| Wafer size | Wafer auto load/unload | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Plasma-Therm Unaxis ICP | Tegal 1512e |
| Specifications | ||
| Configuration | Gas Box:[1] | — |
| Gas 1 | UFC 1660, Cl2, 100 sccm, +/- 3% accuracy[1] | — |
| Gas 2 | MKS 1479, HBr, 100 sccm, +/- 3% accuracy[1] | — |
| Gas 3 | MKS 1479, SF6, 100 sccm, +/- 3% accuracy[1] | — |
| Gas 4 | UFC 8100, BCl3, 100 sccm 3%, +/- 3% accuracy[1] | — |
| Gas 5 | MKS 1479, O2, 20 sccm 3%, +/- 3% accuracy[1] | — |
| Gas 6 | MKS 1479, He, 20 sccm 3%, +/-3% accuracy[1] | — |
| Gas 7 | UFC 1660, Ar, 100 sccm 3%, +/- 3% accuracy[1] | — |
| Gas 8 | MKS 1479, N2, 20 sccm 3%, +/- 3% accuracy[1] | — |
| Wafer size | Wafer auto load/unload[1] | — |
| Temperature | Watlow 988 Chamber Chuck Temperature Control: (20-300°C) +/- 1°C[1] | — |
| Generator | ENI ACG 6 B[1] | — |
| Pressure Control Range | 100 mTorr[1] | — |
| VAT Valve Control | PM 5[1] | — |
| Turbo Pump Limit Vacuum | 5.0 E-6 Torr[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[2] |
| Stated configuration | — | With modules assembly for CI-4222[2] |
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