Comparison ledger
Plasma-Therm Unaxis ICP, Tegal 1511e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Unaxis ICPPlasma-Therm | 1511eTegal |
|---|---|---|
| OEM | Plasma-Therm | Tegal |
| Category | Etch | Etch |
| Wafer size | Wafer auto load/unload | three- to six-inch wafers |
| Process node | — | — |
| Introduced | — | 1984 |
| Production run | — | 1984– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Plasma-Therm Unaxis ICP | Tegal 1511e |
| Specifications | ||
| Configuration | Gas Box:[1] | — |
| Gas 1 | UFC 1660, Cl2, 100 sccm, +/- 3% accuracy[1] | — |
| Gas 2 | MKS 1479, HBr, 100 sccm, +/- 3% accuracy[1] | — |
| Gas 3 | MKS 1479, SF6, 100 sccm, +/- 3% accuracy[1] | — |
| Gas 4 | UFC 8100, BCl3, 100 sccm 3%, +/- 3% accuracy[1] | — |
| Gas 5 | MKS 1479, O2, 20 sccm 3%, +/- 3% accuracy[1] | — |
| Gas 6 | MKS 1479, He, 20 sccm 3%, +/-3% accuracy[1] | — |
| Gas 7 | UFC 1660, Ar, 100 sccm 3%, +/- 3% accuracy[1] | — |
| Gas 8 | MKS 1479, N2, 20 sccm 3%, +/- 3% accuracy[1] | — |
| Wafer size | Wafer auto load/unload[1] | — |
| Temperature | Watlow 988 Chamber Chuck Temperature Control: (20-300°C) +/- 1°C[1] | — |
| Generator | ENI ACG 6 B[1] | — |
| Pressure Control Range | 100 mTorr[1] | — |
| VAT Valve Control | PM 5[1] | — |
| Turbo Pump Limit Vacuum | 5.0 E-6 Torr[1] | — |
| tool type | — | tri-electrode dual-frequency plasma etch system[2] |
| wafer size | — | three- to six-inch wafers[2] |
| first sold | — | 1984[2] |
| system characteristic | — | first vacuum-loadlocked dual-frequency tri-electrode etch system[2] |
| First vacuum-loadlocked dual-frequency tri-electrode etch system | — | Yes[2] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →