Comparison ledger
Pfeiffer Alcatel 601 E DRIE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Alcatel 601 E DRIEPfeiffer | 1512eTegal |
|---|---|---|
| OEM | Pfeiffer | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Pfeiffer Alcatel | Tegal 1512e |
| Specifications | ||
| Configuration | With:[1] | — |
| Type | Deep Reactive Ion Etch system[2] | — |
| Category | Etch[2] | — |
| Model | 601 E[1] | — |
| Make | Pfeiffer / Alcatel[1] | — |
| Power | Advanced Energy RF-F2[2] | — |
| Vacuum | VAT Adaptive Pressure Controller[2] | — |
| Configuration / options | Alcatel ACT 1300 M[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[3] |
| Stated configuration | — | With modules assembly for CI-4222[3] |
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