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Comparison ledger

0020 Contour ProjectorversusMetaPulse 200 XCu Metal Film Measurement

OGP 0020 Contour Projector, Onto Innovation MetaPulse 200 XCu Metal Film Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMOGPOnto Innovation
CategoryPrecision OpticsPrecision Optics
Wafer size—Wafer Mapping
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyOGP (Optical Gaging Products) 0020 Contour ProjectorOnto Innovation MetaPulse 200
Specifications
Configuration50-60 Cycle[1]Non copper tool; double path tool delay stage[2]
Voltage115 V[1]—
Cooling Water Required Minimum Flow—0.79 GPM (3.00 l/m)[2]
Min Temp—12 *C (54 *F, 285.00 *K)[2]
Max Temp—20 *C (68 *F, 293 *K)[2]
Wafer size—Wafer Mapping[2]
Controller Type—PC Controller[2]
External Cooling—Water Cooled[2]
Cooling Water Required—Minimum Flow: 0.79 GPM (3.00 l/m) Min Temp: 12 *C (54 *F, 285.00 *K) Max Temp: 20 *C (68 *F, 293 *K)[2]
Operating Air Pressure—14.00 PSI (96,534.20 N/sq m)[2]
Vacuum Required—0.98 in Hg (24.89 mm Hg)[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing