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200 alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
SUSS MicroTec
MA 200 Gen 3 Mask
Lithography
The SUSS MA 200 Gen 3 is a mask aligner for lithography applications, with source-stated wafer sizes of 6 inch and 8 inch and an OEM-stated maximum wafer size of up to 8"/200 mm.
SUSS MicroTec
MA 6 Mask
Lithography
The SUSS MA 6 Mask Aligner is a semiconductor lithography tool used for mask alignment and exposure, supporting various wafer sizes and featuring infrared alignment and a split-field microscope.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
Ultratech
1000 Family
Lithography
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
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