Waferpedia

Comparison ledger

300versus1000P

Novellus 300, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
300Novellus
OEMNovellusYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size300mm—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilyNovellus 300YES 1000P
Specifications
Target tool size300 mm tools[1]—
User interfaceProteus user interface[1]—
Platform functionHigh-resolution data collection and management, advanced equipment applications, advanced factory automation, and remote e-diagnostics connectivity[1]—
ModulesAthena Knowledge Base (AKB), Athena Advanced Factory Automation (AFA), Athena Remote (AR)[1]—
AKB capabilitiesStatistical Process control, equipment fault monitoring and notification, sensor integration, and remote connectivity for e-diagnostics[1]—
AFA standards and interfacesSEMI standards for Equipment Data Acquisition (EDA) "Interface A"; connections to Modbus and HSMS[1]—
AR functionEnables access to the Novellus tool GUI and the ATHENA KB GUI from a computer outside of the cleanroom[1]—
Model—1000P[2]
System type—Plasma cleaning system[2]
Shelf configuration—Four 16 x 16 inch shelves[2]
Total capacity—1024 square inches[2]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[2]
Number of shelves—4[2]
Shelf size—16 x 16 inches[2]
Power—1000 W[3]
Configuration—Parallel plate[3]
Operation modes—Active, RIE, Downstream[2]
Sample size range—From smallest semiconductor chip to large flat panels[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]semistarcorp.comsemistarcorp.com