Waferpedia

Comparison ledger

NSR S 207 Dversus150 e Mask

Nikon NSR S 207 D, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
OEMNikonSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyNikon NSRSUSS MicroTec 150 e Mask
Cited variants
  • NSR S 207 D with Cymer laser[1]
  • NSR S 207 D with Gigaphoton laser[2]
  • NSR S 207 D with G41K2 Gigaphoton laser[3]
  • NSR S 207 D machine only[4]
  • Nikon NSR S 207 D with Cymer laser[1]
  • Nikon NSR S 207 D with Gigaphoton laser[2]
  • Nikon NSR S 207 D with Gigaphoton laser (second unit)[5]
  • Nikon NSR S 207 D with G41K2 Gigaphoton laser[3]
—
Specifications
ConfigurationWith Cymer laser[1]—
Laser source (variant)Cymer laser[1]—
OEMNikon[1]—
ModelNSR S 207 D[1]—
Equipment typeStepper[1]—
LaserCymer laser[1]—
Vintage2005[1]—
Last Confirm DateJuly 20, 2023[4]—

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]Equipment inventory listing