Waferpedia

Comparison ledger

8800versus8-2P-CP

Mattson 8800, YES 8-2P-CP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
8800Mattson
OEMMattsonYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size200mm200mm
Process node0.25-micron—
Introduced1997—
Production run——
Lifecycle——
Lifecycle milestones1997 Award recognition · 1997 Product award—
Control system——
Generationthird-generation—
FamilyMattson 8800YES 8-2P-CP
Cited variants—
Specifications
Tool typeThird-generation RTP tool[2]—
Process target0.25-micron process requirements[2]—
Wafer size200 mm[2]200 mm wafers[1]
Wafer formatSingle-wafer[2]—
Temperature performanceImproves temperature uniformity and repeatability[2]—
ThroughputSignificantly boosts throughput[2]—
Ceramic Shield optionBackside emissivity independence and better wafer-to-wafer repeatability[2]—
Nitrogen curtainMinimum pre-purge time and high-throughput configuration[2]—
High process purge gas flowFast chamber purging for high-throughput configuration[2]—
ez-DTCHigh-throughput configuration and improved control[2]—
High temperature end effectorHigh-throughput configuration[2]—
Double O-ring seal systemPrevents product loss[2]—
Swivel cassettes with independent swivelsHigher throughput[2]—
Standard slip-free ring packageHigh temperature slip-free processing and improved uniformity[2]—
CertificationsCE certified and UL listed[2]—
Generationthird-generation RTP tool[2]—
Process node0.25-micron[2]—
AwardSemiconductor International Editor's Choice Best Product Award (1997)[2]—
Model—8-2P-CP[1]
Series—YES-PB Series[1]
Load type—manual load[3]
Process interface—touch screen interface enables the process to be fully automated[3]
Cooling package—uses air, no water[3]
Airflow—vertical laminar airflow[3]
Condensate control—coalescing condensate trap assembly[3]
Process type—manual-load high-temperature cure oven[3]
Applications—Polyimide/PBO cure; BCB bake; Low temp polymers cure; Copper anneal; Low-K dielectric cure; Copper oxide removal; Aluminum anneal[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org