Waferpedia

Comparison ledger

2300 e 5 Kiyoversus1512e

Lam Research 2300 e 5 Kiyo, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
2300 e 5 KiyoLam Research
1512eTegal
OEMLam ResearchTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research 2300Tegal 1512e
Specifications
Configuration3 Chamber + 1 Strip[1]—
LoadportTDK TAS300[1]—
ATM RobotKawasaki P/N 3NT510B-A002[1]—
TM RobotBrooks 201600-294-0002[1]—
MKS E28D-29237 Process Vacuum Gauge0.1 Torr[1]—
MKS 625D-30518 Chamber Vacuum Gauge1 Torr[1]—
Number of Chambers3 Chamber + 1 Strip[1]—
Turbo PumpEdwards STP-XA3203CV[1]—
Turbo Pump ControllerEdwards SCU-1600[1]—
Bias RF GeneratorLam 3156110-214[1]—
Tool type—Industrial RIE plasma etcher system[2]
Stated configuration—With modules assembly for CI-4222[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com