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.498 PSL WaferversusScientific FEI Helios NanoLab 600 FIB-SEM

KLA .498 PSL Wafer, Thermo Fisher Scientific FEI Helios NanoLab 600 FIB-SEM, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMKLAThermo Fisher
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA .498 PSL WaferThermo Fisher Scientific FEI Helios NanoLab 600 FIB-SEM
Specifications
ConfigurationNIST Traceable[1]Schottky FE mounted on the NG hot swap gun module[2]
NIST traceabilityYes[1]—
Magnification—69x-2300000x[2]
Stage Control—5 axes motorized XYZRT 6” UHR stage with piezo control[2]
Beam - Schottky FE mounted on NG hot swap gun module—Schottky field emitter on NG hot swap gun module[2]
Beam - Gallium Liquid Metal—Gallium liquid metal ion source[2]
Beam - ELSTAR—ELSTAR[2]
Beam - Sidewinder—Sidewinder ion column[2]
Electron Column—Present[2]
ION Column—Present[2]
Resolution (Optional WD) - 15 kV—0.9 nm @ 15 kV (optional WD), 1.4 nm @ 15 kV (optional WD)[2]
Resolution (Coincident WD) - 15 kV—1 nm @ 15 kV[2]
Resolution (Coincident WD) - 5 kV—1.6 nm @ 5 kV[2]
Resolution (Coincident WD) - kV (unspecified)—2.5 nm @ (unspecified kV)[2]
Resolution (Coincident WD) - 30 kV—5 nm @ 30 kV[2]
Stage Travel - X/Y—150 mm[2]
Stage Travel - Z—0-20 mm[2]
Stage Tilt—-10° to +60°[2]
Detector—Through-lens detection (TLD) for SE and BSE[2]
Omniprobe—Autoprobe 200[2]
STEM Detector—Retractable[2]
Plasma Cleaner—Ibss Group GV10x[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing