Comparison ledger
KLA 1.112 PSL Wafer, KLA Surfscan 6220 Particle Defect, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | KLA Surfscan 6220 |
| Specifications | ||
| Configuration | NIST Traceable[1] | Cosmetic Modification:[3] |
| Wafer Size | 8 inch[1] | — |
| NIST Traceable | True[1] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[2] | — |
| Model | — | Surfscan 6220[3] |
| OEM | — | KLA[3] |
| Category | — | Metrology & Inspection[4] |
| Tool type | — | particle defect system[3] |
| Application | — | bare wafer surface defect inspection system[5] |
| Wafer sizes | — | 2", 3", 4", 6" and 8" wafer capable[5] |
| Sensitivity | — | 0.09 micrometer diameter PSL sphere equivalent with greater than 80 percent capture rate (0.112um @ 90%)[5] |
| Repeatability | — | count repeatability error less than 0.5 percent at 1 standard deviation (mean count greater than 500, 0.364 mm dia. latex spheres)[5] |
| Accuracy | — | count accuracy better than 99 percent (verified with VLSI Standards' Relative Standard)[5] |
| Throughput | — | 100 wph (200 mm) at 0.12 mm[5] |
| Contamination | — | less than 0.005 particles/cm2 greater than 0.15 mm dia. per single pass[5] |
| Cassette handling | — | single puck wafer handling from two cassettes (one sender/receiver, one receiver)[5] |
| Illumination source | — | 30 mW Argon-Ion laser, 488 nm wavelength[5] |
| Operator interface | — | mouse and/or dedicated user keypad[5] |
| Cosmetic modification | — | Stanley Still monitor and emergency power-off box removed from the tool; monitor and power switch remote on an adjacent table[3] |
| Vintage | — | 1995[3] |
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