GCA
AS200 alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
ASML
PAS 5500
200mm
Lithography
The ASML PAS 5500/275D is a high-throughput i-line stepper with 5X reduction, 365 nm exposure, and automated wafer handling for substrates up to 200 mm diameter.
SUSS MicroTec
BA8 Gen4 Pro
200mm
Lithography
The SUSS MicroTec BA8 Gen4 Pro is a semi-automated mask alignment and wafer bonding system for 200 mm wafers, with capabilities including exposure, UV bonding, fusion bonding, imprinting, and selective plasma activation.
SUSS MicroTec
MA200 Gen3
200mm
Lithography
The SUSS MicroTec MA200 Gen3 is a fully automated mask aligner for high-volume lithography on wafers and square substrates up to 200 mm.
Nikon
NSR 2205 i 14 E 2 i-Line
200mm
Lithography
Nikon NSR 2205 i 14 E 2 is an i-line stepper.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
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