Comparison ledger
EV Group 101, Nikon Super Coolscan 5000 ED Slide, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | |
|---|---|---|
| OEM | EV Group | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 2003– |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2026 Third-party support only |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Nikon Super Coolscan 5000 ED Slide |
| Cited variants | — |
|
| Specifications | ||
| OEM | EV Group[2] | — |
| Model | 101[2] | — |
| Equipment name | EVG 101 Spray Coater[2] | — |
| NEMO ID | evgspraycoat[2] | — |
| Training required | EVG 101 Training[2] | — |
| Training duration | 1.50 hours[2] | — |
| Processing technique | Resist Spray Coat (manual)[2] | — |
| Cleanliness | "All"[2] | — |
| Location | SNF Paul G Allen L107 Cleanroom[2] | — |
| Wafer diameter (substrate size) | up to 300 mm[3] | — |
| Available modules | Spin coat / OmniSpray® / develop[3] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[3] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[3] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[4] | — |
| Cleanliness group (at SNF) | "All"[2] | — |
| Equipment type | — | Fixed film, movable plane single-pass optical scanning system[5] |
| Supported originals | — | 35mm mounted slides and 35mm film strips[5] |
| Optical resolution | — | 4000 dpi[5] |
| Density range | — | 4.8[6] |
| A/D conversion | — | 16-bit[6] |
| Output bit depth | — | 8-bit or 16-bit[5] |
| Connection interface | — | USB 2.0[6] |
| Software | — | Nikon Scan 4.0[5] |
| Scanning speed | — | Preview scans in 11 seconds; full scans as fast as 20 seconds[7] |
| ICE technology | — | Digital ICE4[7] |
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