Waferpedia

Comparison ledger

1034versusP 300 J Wafer

Electroglas 1034, Micromanipulator P 300 J Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1034Electroglas
P 300 J WaferMicromanipulator
OEMElectroglasMicromanipulator
CategoryTest & ProbeTest & Probe
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyElectroglas 1034Micromanipulator P 300 J Wafer
Specifications
Wafer size—300 mm[1]
Stage range—300 x 300 x 50 mm, theta 15 degrees[1]
Resolution—0.1 micron (stage, platen, microscope drive)[1]
Microscope drive range—100 x 100 mm (X-Y), 200 mm (Z)[1]
Station dimensions (W x D x H)—33 x 40 x 33 inches (84 x 102 x 84 cm)[1]
Station weight—480 lbs (218 kg)[1]
RMC-7 controller dimensions—17.8 x 19.7 x 5.5 inches (45.2 x 50 x 13.9 cm)[1]
RMC-7 controller weight—24 lbs (11 kg)[1]
Vacuum requirement—25 in-Hg[1]
Controller power input—85 to 265 VAC, 47-63 Hz, 2.4 Amps typical[1]
Temperature ranges (configurable)—Ambient to 300°C, 0°C to 300°C, -55°C to 300°C[2]
Platen material—Magnetic stainless steel[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]micromanipulator.commicromanipulator.com
  2. [2]mercia-semiconductor.commercia-semiconductor.com