Waferpedia

Comparison ledger

300mm-OfenversusNS300Z

Despatch 300mm-Ofen, Tokyo Electron NS300Z, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
300mm-OfenDespatch
NS300ZTokyo Electron
OEMDespatchTokyo Electron
CategoryWet Processing / CleanWet Processing / Clean
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyDespatch 300mm-OfenTokyo Electron NS300Z
Specifications
AutomationsfunktionNimmt sowohl 200mm als auch 300mm-Scheiben auf.[1]—
Werkzeugkapazität50 Scheiben mit Standard Zwei-Kammerkonfiguration; zusätzliche Kammern können angefügt werden.[1]—
Thermische ProzesseigenschaftenInertatmosphäre; 175°C Maximaltemperatur; Temperaturgleichmäßigkeit ±1.0°C bei 95°C Eintaucht temperatur; aktive Kühlung für schnelles Abkühlen; HEPA-Filter.[1]—
Zusätzliche EigenschaftenErfüllt SEMI S2/S8 und SEMATECH Anhänge A, B und C; grafische Benutzer-Schnittstelle (GUI); erfüllt 300mm SEMI Kommunikationsstandards; FOUP ID-Leser; 2 Ebenen Überwachung; Scheiben-ID-Leser; nicht unterbrechbare Stromversorgung (UPS).[1]—
AbmessungenEtwa 262 cm Breite und 224 cm Länge.[1]—
Automation functionAccepts both 200mm and 300mm wafers.[1]—
Tool capacity50 wafers with standard two-chamber configuration; additional chambers can be added.[1]—
Process atmosphereInert atmosphere.[1]—
Maximum temperature175°C[1]—
Temperature uniformity±1.0°C at 95°C immersion temperature.[1]—
CoolingActive cooling for rapid cool-down.[1]—
FilterHEPA filter.[1]—
Additional featuresMeets SEMI S2/S8 and SEMATECH Appendices A, B, and C; graphical user interface; meets 300mm SEMI communication standards; FOUP ID reader; 2-level monitoring; wafer ID reader; uninterruptible power supply (UPS).[1]—
DimensionsAbout 262 cm wide and 224 cm long.[2]—
Wafer size—300mm[3]
System type—Scrubber[3]
Tool type—Scrubber system[3]
Process modules—Process modules with proven reliability and stability[3]
Performance—Further productivity improvements[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]waferpedia.comwaferpedia.com
  3. [3]tel.comtel.com