Waferpedia

Comparison ledger

Apogee 450 SpinversusApogee Spin

CEE Apogee 450 Spin, CEE Apogee Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCEECEE
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
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FamilyCEE ApogeeCEE Apogee
Specifications
Configuration208-240 V[1]Polymide[4]
ModelApogee 450[1]—
Equipment typeSpin coater[1]—
Wafer sizes6, 8, 12 inch[1]—
Max substrate size450 mm round or 14" x 14" square[2]—
Max spin speed6,000 rpm[2]—
Max acceleration30,000 rpm/s[2]—
Spin speed repeatability0.2 rpm[2]—
Acceleration resolution< 0.2 rpm/s[2]—
Spin speed resolution0.2 rpm[2]—
GUI7-inch full-color touchscreen[2]—
Number of recipesUnlimited[2]—
Step time resolution0.1 s[2]—
Weight85 lb (38.6 kg)[2]—
Voltage208-230 VAC[2]—
Drain port3/4" OD[2]—
Full load current6A (max)[2]—
Exhaust port1.5" OD, 0.4” H2O @ 30 CFM (100 Pa @ 50 CMH)[2]—
Vacuum1/4" push to connect, <33 kPa abs[2]—
Automated dispense gasN2/CDA, 70 psi (482 kPa)[2]—
InterfaceUSB 2.0, Ethernet, StreamSync™ communication protocol[3]—
Chamber materialHDPE spin bowl[3]—
Vacuum and lid interlockYes[3]—
Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]costeffectiveequipment.comcosteffectiveequipment.com
  3. [3]instrumenthive.cominstrumenthive.com
  4. [4]inventory listing