Comparison ledger
CEE 1000 Hot Plate, Tokyo Electron Alpha 801 D Vertical, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Alpha 801 D VerticalTokyo Electron | |
|---|---|---|
| OEM | CEE | Tokyo Electron |
| Category | Thermal / Diffusion | Thermal / Diffusion |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 1000 Hot Plate | Tokyo Electron Alpha |
| Specifications | ||
| Configuration | 4"[1] | ATM Oxide[2] |
| Type | Hot Plate[1] | Vertical Furnace[2] |
| Wafer Size | 4 inch[1] | 8 inch[2] |
| Power AC | — | 480 V[2] |
| Phase | — | 3 Phase[2] |
| Process Type | — | ATM Oxide (atmospheric oxide deposition)[2] |
| Power | — | 480 V AC, 3 Phase[2] |
| Frequency | — | 50/60 Hz[2] |
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