Waferpedia

Comparison ledger

5500 iZAversus1505 G 6 E

Canon 5500 iZA, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCanonNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run—1988–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon 5500 iZANikon 1505
Cited variants—
Specifications
Model typei-Line (365nm) Stepper[2]—
Wafer size300mm; 200mm[2]—
Resolution≤0.35μm[2]650 nm[5]
Numerical Aperture (NA)0.45 ~ 0.57[2]—
Reticle size6in. (0.25in. thick)[2]—
Reduction ratio4:1[2]—
Field size26mm x 33mm[2]—
Overlay accuracy≤ 16nm (M+3)[2]—
Throughput≥93wph (300mm); ≥155wph (200mm)[2]—
Exposure wavelengthi-line (365nm)[2]—
Lamp4.5kW high-pressured mercury lamp[2]—
Overlay accuracy achieved16nm through reticle magnification compensation and through improvements in Z and tilt compensation accuracy, stage environment control accuracy, and calibration accuracy[2]—
PlatformFPA-5000 platform[2]—
ManufacturerCanon[3]—
Model5500 iZA[3]1505 G 6 E[4]
Tool typei-line stepper lithography system[1]—
Last confirmed dateAugust 22, 2023[3]—
Configuration—5" reticle[4]
Numerical Aperture—0.54[5]
Reduction—5x[5]
Exposure Field—15 x 15 mm[5]
Alignment Accuracy—130 nm[5]
Wafer Size—4 inch[4]
Light Source—g-line[6]
Introduction Year—1988[5]
NA (Numerical Aperture)—0.54[5]
Make—Nikon[4]
Category—Stepper[4]
Wafer Sizes—4 inch[4]
Exposure type—g-line[5]
NA—0.54[5]
Exposure field—9.3 x 18.8 mm[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]generalmanual.comgeneralmanual.com
  3. [3]Equipment inventory listing
  4. [4]inventory listing
  5. [5]web.archive.orgweb.archive.org
  6. [6]ece.utoronto.caece.utoronto.ca